H&M
Party Focus




Brand
ProjectParty Focus
Date
Oct 2025
Description
For the Party Focus campaign, H&M highlights seasonal accessories and tailored apparel through a series of minimalist studio compositions. The project spans both commercial product photography and editorial portraits, focusing on sharp textures and clean lines. Photographer Marius Uhlig and art director Kevin Pfaff utilize directional lighting to emphasize the material details of patent leather, satin, and structured tailoring. The imagery features model Lolo Barth, supported by hair styling from Pål Berdahl and makeup artistry by Ignacio Alonso. The project adopts a clean, high-contrast aesthetic that maintains focus on the interplay between metallic surfaces, sculptural jewelry, and classic garment construction.
Style
Vertical, Clean
Color
Jet Black
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