ProjectRisk of Fall

Risk of Fall 2026
Associated creatives
Tags
Description
This fashion editorial portrait features a model captured by photographer Leo Arnaud for Family Style under the project title Risk of Fall. The subject wears a black sleeveless top paired with dark structured shorts against a neutral, softly textured fabric backdrop. The image is styled by Pia Abbar with makeup by Marie Dufresne and casting by Anita Bitton. The composition employs a vertical framing with soft tonal contrast and a direct, unsmiling gaze from the model.
Style
Editorial, Vertical, Desaturated, Monochrome
Techniques
Analogue / film, Low-key / chiaroscuro
Industries
Designer Fashion
Color
Jet Black (70%)
Background
Fabric Texture
Context
Editorial

